Patent 2017200337

Diffusion-rate-limited thermal chemical vapor deposition coating

Abstract

P1450AUUS ABSTRACT Thermal chemical vapor deposition coated articles and thermal chemical vapor deposition processes are disclosed. The article includes a substrate and a thermal chemical vapor deposition coating on the substrate. The thermal chemical vapor deposition coating includes properties from being produced by diffusion-rate-limited thermal chemical vapor deposition. The thermal chemical vapor deposition process includes introducing a gaseous species to a vessel and producing a thermal chemical vapor deposition coating on an article within the vessel by a diffusion-rate-limited reaction of the gaseous species. 103 109 105 102 107--,,. 115 113 109 103 105 101 115 113 100 FIG. 1

Information

Australian application number
2017200337
Country
US
Status
Filed
Type
Standard
Applicant
SilcoTek Corp., CORP (US)
Application year
2017

International Patent Classification (IPC) codes