Patent 2017265092

A monitoring system based on etching of metals

Abstract

ABSTRACT Title: A MONITORING SYSTEM BASED ON ETCHING OF METALS Compositions, devices and processes related to etching of a very thin layer or fine particles of a metal are disclosed for monitoring a variety of parameters, such as time, temperature, time-temperature, thawing, freezing, microwave, humidity, ionizing radiation, sterilization and chemicals. These devices have capabilities of producing a long and sharp induction period of an irreversible visual change. The devices are composed of an indicator comprising a very thin layer of a metal (e.g., polyester film having an extremely thin, e.g., about one hundred Angstroms layer of aluminum) and an activator, e.g., a reactant, such as water, water vapor, an acid, a base, oxidizing agent or their precursors, which is capable of reacting with the said indicator. The indicator retains its opacity and metallic luster, e.g., silvery white, mirror like finish of aluminum layer for a long time. The activator destroys the indicator layer including the naturally formed oxide layer. 13927099

Information

Australian application number
2017265092
Country
US
Status
Filed
Type
Standard
Applicant
PATEL, G N, (US)
Application year
2017

International Patent Classification (IPC) codes

Links

ID Relationship
2016202637 Divisional parent